HOME@>@Product Information@>@Oxygen gas controller@>@H2O/O2 Free gas purifier | |||
@>>Oxygen partial pressure controller | |||
@>>Oxygen & Atmosphere control @@examination furnace |
|||
@>>H2O/O2 Free gas purifier | |||
@>>Wet oxygen controller | |||
@@@ Analysis system | |||
@@@ A scientific-experiments device @@@ design and manufacture | |||
@@@ Automatic control and @@@ counting system |
|||
@@@ Microchamber | |||
@@@Product outline | |||
@Water and oxygen free gas purification device (SiWOF-2000) are the new type gas purifiers adapting an oxygen ion conductor. Although continuation operation was difficult for moisture removal device, such as the conventional drier system, a cold lap system, and a filter system, since there is no restriction in the amount of dehumidification, and the amount of deoxidization theoretically, with this device, continuation operation of a long period of time (about one year) is possible. |
|||
@@@Feature and Function |
|||
EOxygen free (less than 1~10E-20atmO2) low dew point (less than DP-90Ž) refining gas can be supplied continuously for a long period of time. ERefining of inactive gas hydrogen gas (N2, Ar, etc.) can ce performed. ELong-term continuation operation is possible. |
|||
@@@System | |||
@The electric moisture decomposition removing method using an oxygen ion conductor (Yttria Stabilized Zirconia) and an oxygen removal function are used. |
|||
@@@Specifications and Performance | |||
Processing gas mass flow | 2.0‚r‚k‚li0.2‚3/‚ˆj | ||
Processing gas loss | Inactive gas (helium,Ar,N2) and hydrogen gas |
||
Processing gas pressure | 0 ` 100kPaigage pressurej | ||
Supply gas purity | An equivalent for the gas for industry (Less than 10ppmvH2O and O2) | ||
Refining gas purity | H2OcLess than 100ppb‚–iDP|90Žj O2cLess than 1~10E-20atm |
||
Size | W270~D250~H1200 | ||
Weight | About 35kg | ||
Power supply | AC100V/1.5‚‹VA | ||
Installation | Wall tapestry type (it is mount preparation with an exclusive caster at an option) |
||
<< BACK |
Page Top@@@HOME@@@Company Profile@@@Contact Us@@@LINK |